Equipment – University of Copenhagen

Quantech > Equipment

Equipment at the Quantech Labs

Electron Beam Lithography

Name

ELIONIX ELS-F125

Application

Direct exposure of electron-sensitive resists like PMMA, ZEP and HSQ for micro- and nano-patterning down to 7 nm line resolution.

Characteristics

Thermal field emission gun.

Acceleration voltages up to 125 kV, probe current up to 300 nA.

100 MHz pattern generator. 

Specimen

Maximum size 4 inch

Location

H.C. Ørsted Institutet, Universitetsparken 5, 2100 København Ø.

Scanning Electron Microscope

Name

JEOL 7800F prime

Application

High resolution scanning electron micrographs of wafer/devices during or after processing.

Characteristics

Low voltage scan (0.01 – 30 kV)

Magnification: 10x – 1.000.000x

Resolution: 0.7 nm between 1 and 15 kV.

Gentle beam system

Specimen

Small samples up to 1.5 cm for cross section inspection. Wafers up to 2 inch for top down inspection.

Location

H.C. Ørsted Institutet, Universitetsparken 5, 2100 København Ø.

Dilution refrigerator

Name

BlueFors BF-LD400

Application

Cryogen-free system for experiments and measurements requiring milli-Kelvin thermal environment. System is optimised for quantum opto-mechanics with free-space optical beams.

Characteristics

Base temperature: 7 mK (with blinded viewports)

Cooling power at 20 mK: 18 micro-Watts

Cooling power at 100 mK: 550 micro-Watts

22h cool-down time.

Low-vibration package with cryostat on air-springs. <0.1 nm for f>20Hz.

Customized features

Free space optical access through 2 horizontal transmission lines and 1 vertical input line. Windows AR coated for 1550nm.

Optical fibre access, SMF28e+, 1310-1620 nm.

Wiring: 6x low-ohmic wires for positioners; 6x wires for scannes; 12x measurement wires.

Optional hermetic sample chamber for He exchange gas cooling.

Location

Technical University of Danmark

Department of Physics

Fysikvej bld. 309-039

Contact person: Ulrich Hoff (ulrich.hoff@fysik.dtu.dk)