Equipment at the Quantech Labs
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Electron Beam Lithography |
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Name |
ELIONIX ELS-F125 |
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Application |
Direct exposure of electron-sensitive resists like PMMA, ZEP and HSQ for micro- and nano-patterning down to 7 nm line resolution. |
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Characteristics |
Thermal field emission gun. Acceleration voltages up to 125 kV, probe current up to 300 nA. 100 MHz pattern generator. |
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Specimen |
Maximum size 4 inch |
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Location |
H.C. Ørsted Institutet, Universitetsparken 5, 2100 København Ø. |
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Scanning Electron Microscope |
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Name |
JEOL 7800F prime |
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Application |
High resolution scanning electron micrographs of wafer/devices during or after processing. |
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Characteristics |
Low voltage scan (0.01 – 30 kV) Magnification: 10x – 1.000.000x Resolution: 0.7 nm between 1 and 15 kV. Gentle beam system |
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Specimen |
Small samples up to 1.5 cm for cross section inspection. Wafers up to 2 inch for top down inspection. |
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Location |
H.C. Ørsted Institutet, Universitetsparken 5, 2100 København Ø. |
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Dilution refrigerator |
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Name |
BlueFors BF-LD400 |
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Application |
Cryogen-free system for experiments and measurements requiring milli-Kelvin thermal environment. System is optimised for quantum opto-mechanics with free-space optical beams. |
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Characteristics |
Base temperature: 7 mK (with blinded viewports) Cooling power at 20 mK: 18 micro-Watts Cooling power at 100 mK: 550 micro-Watts 22h cool-down time. Low-vibration package with cryostat on air-springs. <0.1 nm for f>20Hz. |
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Customized features |
Free space optical access through 2 horizontal transmission lines and 1 vertical input line. Windows AR coated for 1550nm. Optical fibre access, SMF28e+, 1310-1620 nm. Wiring: 6x low-ohmic wires for positioners; 6x wires for scannes; 12x measurement wires. Optional hermetic sample chamber for He exchange gas cooling. |
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Location |
Technical University of Danmark Department of Physics Fysikvej bld. 309-039 Contact person: Ulrich Hoff (ulrich.hoff@fysik.dtu.dk) |